WET工艺介绍

是 否 +2 论坛币

k人 参与回答

经管之家送您一份

应届毕业生专属福利!

求职就业群

赵安豆老师微信：zhaoandou666

经管之家联合CDA

送您一个全额奖学金名额~ !

立即领取

感谢您参与论坛问题回答

经管之家送您两个论坛币！

+2 论坛币

WET工艺介绍
Purpose of Wet Cleaning Process
Through to a series of processes to make the wafers free from particles, organic contaminations, metal contamination, surface microroughness and native oxide using some kinds of chemicals including DIW.
Purpose of Wet Cleaning Process
For Etching process Oxide remove. Nitride remove. Photoresist & polymer remove. For Cleaning process Free of particles. Free of metal ion. Free of organic. Free of micro-roughness. Free of native oxide.

扫码加我 拉你入群

请注明：姓名-公司-职位

以便审核进群资格，未注明则拒绝

分享0 收藏0 回帖

关键词：wet including Processes Chemicals Cleaning