1、A method for theassessment of oxide charge density and centroid in metal‐oxide‐semiconductor structures afteruniform gate stress
Kies, R. Egilsson, T.Ghibaudo, G.Pananakakis, G.
Laboratoire de Physique des Composants à Semiconducteurs, URA CNRS, ENSERG, BP257, 38016 Grenoble, France
This paper appearsin: AppliedPhysics Letters
Issue Date: Jun 1996
Volume: 68 Issue: 26
On page(s): 3790 - 3792
ISSN: 0003-6951
Digital Object Identifier: 10.1063/1.116618
Date of Current Version: 18 六月 2009
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2、Measurements of spatial charge centroid location in a nonmetalizedpolymer film
Xie, Xishun Huang, XiaoqinWu, Zonghan
Department of Physics, Southeast University, Nanjing 210018, People’s Republicof China
This paper appearsin: Journalof Applied Physics
Issue Date: Jul 1992
Volume: 72 Issue: 1
On page(s): 306 - 307
ISSN: 0021-8979
Digital Object Identifier: 10.1063/1.352360
Date of Current Version: 07 七月 2009
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